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It was also named after Semiconductor, Photomask, IC, integrated circuits, integrated-circuits, integratedcircuits, integrated circuit fabrication, integrated-circuit-fabrication, integratedcircuitfabrication, silicon, wafer, SPIE, SEMATECH, mask industry, mask-industry, maskindustry, mask inspection, mask-inspection, maskinspection, nanochannel glass, nanochannel-glass, nanochannelglass, SMIF interface, SMIF-interface, SMIFinterface, laser mask writer, laser-mask-writer, lasermaskwriter, VPG, VLSI, phase-shifting, altering-aperture phase-shifting, altering-aperture-phase-shifting, altering-aperturephase-shifting, immersion lithography, immersion-lithography, immersionlithography, hyper-NA, EUV, MEFF, scattering, pellicle, thin film, thin-film, thinfilm, nitrocellulose, silver halide, silver-halide, silverhalide, soda glass, soda-glass, sodaglass, borosilicate, quartz, chromium, plotter, master plate, master-plate, masterplate, fused silica plate, fused-silica-plate, fusedsilicaplate, stepper, scanner, multi-patterning, photoreticle, photomask, photolithography, rubylith, mylar, mask set, mask-set, maskset, optical pattern generator, optical-pattern-generator, opticalpatterngenerator, step-and-repeat camera, step-and-repeat-camera, step-and-repeatcamera, mutiple-IC mask, mutiple-IC-mask, mutiple-ICmask, reticles, electron beam lithography, electron-beam-lithography, electronbeamlithography, laser lithography, laser-lithography, laserlithography, contact aligner, contact-aligner, contactaligner, and photoresist.